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Tempress - Tube 2 - Low Pressure CVD (0004)
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Pascual Muñoz
2nd Responsible:
Giuseppe L. Bufi
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Description
Tube 2: LPCVD (SiCl2H2, NH3, O2, N2)
Funding and acknowledgements:
Retrofit of Tube 2 for LPCVD (2019) funded by GVA/IDIFEDER2018/042 project
Retrofit of Tube 2 for low stress silicon nitride LPCVD (2020) funded by GVA/IDIFEDER2021/046 project
Details
Tool name:
Tempress - Tube 2 - Low Pressure CVD
Area/room:
White room
Category:
Thermal processes
Manufacturer:
Tempress
Model:
TS81003
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