The SPIN150i & SPIN200i spin processors are advanced systems that offer precise, repeatable process control. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. The SPIN150i & SPIN200i are small-sized footprint systems with the capacity for up to 6” wafers (SPIN150i), or up to 8” wafers (SPIN200i).

Features:

• Programmable CW & CCW rotation
• Spin speed 0 rpm - 12,000 rpm, accuracy +/- 0.1 rpm
• Acceleration / deceleration 1 - 30,000 rpm/sec, selectable per step