MicroWriter ML®3 is a direct-write photolithography machine. Unlike conventional photolithography performed on a mask-aligner in which a physical mask is used to define the exposed patterns, direct-write lithography uses a software mask. This software mask is designed using standard graphics software and so can be modified rapidly and at no cost.

Features:

• Maximum substrate size [mm]: 230 x 230 x 15
• Maximum writing area [mm]: 195 x 195
• Exposure resolutions [µm]: 0.6, 1, 2, 5 
• Alignment microscope objectives: x3, x5, x10, x20
• Exposure wavelength [nm]: 385
• Overlay alignment accuracy at best resolution [µm]: ±0.5
• Minimum addressable grid [nm]: 100
• Motion stage minimum XY step size [nm]: 20
• Optical surface profiler Z resolution [nm]: 100