The Model 152 is a stand-alone, single-sided alignment and exposure system, which utilizes a photomask holder for glass photomasks and a substrate holder with stepper motors for X, Y, and Theta “θ“ alignment. 

This model will be set up to provide two exposure modes: soft contact (the weight of the photomask and photomask holder) and vacuum contact.

High resolution exposure is produced by a collimated light source and optics, which provide the ability to produce fine lines and features with good sidewall structure.

Exposure energy is provided by a Hg arc lamp, which is rich in UV from 350 nm to 450 nm with peak intensities at 365 nm, 405 nm, and 436 nm which corresponds with the sensitivity peak for mid UV photoresists.